Figure 2.

SEM cross sections of Si thin films fabricated under different deposition parameters. SEM cross sections of Si thin films deposited by (a) room temperature in an Ar atmosphere, (b) room temperature in 4% H in Ar and (c) 200°C in 4% H in Ar.

Murray et al. Nanoscale Research Letters 2013 8:272   doi:10.1186/1556-276X-8-272
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