Figure 4.

SEM image, optical reflectance, and photo/schematic of a-Si and cross-sectional |E| distribution of the electromagnetic (EM) wave. (a) The 60°-tilted-angle-view SEM image of amorphous Si (a-Si) nanocone arrays fabricated with plasma-enhanced chemical vapor deposition (PECVD), with the AAM template shown in the inset. (b) Optical reflectance of a-Si nanocone array and a-Si thin film, with the photographs of a-Si nanocone array (left photo) and a-Si thin film (right photo) on a transparent glass substrate shown in the inset. (c, d) Simulated cross-sectional |E| distribution of the EM wave on nanocone arrays and planar. (e, f) Photo and schematic of flexible a-Si nanocone array embedded in PDMS.

Lin et al. Nanoscale Research Letters 2013 8:268   doi:10.1186/1556-276X-8-268
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