Table 1

Element content of the oxide nanofilms before and after annealing at 450°C and 550°C
Tested area Oxide nanofilm condition Element (at.%)
Ti Al V O
α-Phase region After anodization 61.45 6.52 2.68 29.35
Annealed at 450°C 26.90 3.39 0.87 68.83
Annealed at 550°C 23.09 2.96 0.61 73.34
β-Phase region After anodization 65.35 6.94 3.88 23.83
Annealed at 450°C 44.40 4.79 2.15 48.66
Annealed at 550°C 32.76 3.60 1.50 62.15

Li et al.

Li et al. Nanoscale Research Letters 2013 8:25   doi:10.1186/1556-276X-8-25

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