Figure 1.

Schematic illustration of the procedure for the fabrication of Ni-silicide/Si heterostructured nanowire arrays on Si(100) substrates. (a) Spread close packed monolayer PS spheres array on SiO2/Si(100) substrate, (b) O2 plasma etching, (c) Ar plasma etching, (d) Ag deposition, (e) metal-induced catalytic etching, (f) Ag, PS spheres and SiO2 removing, (g) glancing angle Ni deposition, (h) rapid thermal annealing treatment, and (i) Ni removing.

Hsu et al. Nanoscale Research Letters 2013 8:224   doi:10.1186/1556-276X-8-224
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