Figure 2.

Cross-sectional scanning electron microscopy (SEM) images of FeCo/(FeCo)0.63(SiO2)0.37 film. Prepared by focused ion beam sectioning polished at 30 keV (the design thickness of the FeCo layer was 10 nm, and the FeCo-SiO2layer was 20 nm).

Zhang et al. Nanoscale Research Letters 2013 8:212   doi:10.1186/1556-276X-8-212
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