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Interface properties of SiOxNy layer on Si prepared by atmospheric-pressure plasma oxidation-nitridation

Zeteng Zhuo*, Yuta Sannomiya, Yuki Kanetani, Takahiro Yamada, Hiromasa Ohmi, Hiroaki Kakiuchi and Kiyoshi Yasutake

Nanoscale Research Letters 2013, 8:201  doi:10.1186/1556-276X-8-201

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