Schematic of the SiNW and SiNH array fabrication process. (a) Ag film is fabricated by thermal evaporation on a Si substrate. (b) Ag film with regular holes after relatively low-temperature thermal treatment. (c, d) SiNW arrays achieved after MaCE corresponding to (b). (e) Ag nanoparticles with uniform shape after relatively high-temperature thermal treatment. (f, g) SiNH arrays achieved after MaCE corresponding to (d).
Liu et al. Nanoscale Research Letters 2013 8:155 doi:10.1186/1556-276X-8-155