Effect of normal loads on the etching rates at different etching temperatures. Etching rates η of scanned area produced under various normal loads of 5, 8 and 12 μN at different etching temperatures. The corresponding contact pressure was 3.5, 4.4 and 4.7 GPa, respectively. Dashed line is Arrhenius fitting of the etching rates.
Song et al. Nanoscale Research Letters 2013 8:140 doi:10.1186/1556-276X-8-140