Figure 5.

Refabrication on an existing structure of quartz surface. (a) Initial fabrication by low-destructive scanning under 5 μN on a 5 × 5 μm2 area and etching for 3 h at 293 K. (b) First refabrication by low-destructive scanning under 8 μN in the central 3.5 × 3.5 μm2 area and etching for 3 h at 293 K. (c) Second refabrication by low-destructive scanning under 5 μN in the central 2 × 2 μm2 area and etching for 3 h at 293 K.

Song et al. Nanoscale Research Letters 2013 8:140   doi:10.1186/1556-276X-8-140
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