Figure 2.

Maskless and low-destructive nanofabrication on quartz. (a) Low-destructive fabrication after scanning in 1.5× 3 μm2 area (line-marked) under progressive loads that ranged from 0 to 15 μN. (b) A slope produced by etching the area (a) in KOH solution for 3 h. (c) Five-step hierarchical structure produced by low-destructive scanning under Fn = 5 μN and etching for 3 h, where the scan size of each cycle was successively set as 7, 5.6, 4.2, 2.8 and 1.4 μm. (d) Chessboard-like patterns produced by low-destructive scanning on the selected area under Fn = 12 μN and etching for 3 h, where the scan size was 1 μm and the interval between adjoining scan centres was 2 μm.

Song et al. Nanoscale Research Letters 2013 8:140   doi:10.1186/1556-276X-8-140
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