Figure 5.

Micrographs of 70-nm-pitch gratings patterned by 30 keV on 300- to 330-nm-thick SML. Effect of dose on increasing line width (a) 550 pC/cm, 25-nm gap, (b) 750 pC/cm, 32-nm gap, and (c) 950 pC/cm, 40-nm gap. Data obtained for 20 s ultrasonic development in IPA/water (7:3) and 2 s pentane rinse.

Mohammad et al. Nanoscale Research Letters 2013 8:139   doi:10.1186/1556-276X-8-139
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