Figure 2.

SML contrast curves generated using 30 keV on 300- to 330-nm-thick resist. The development was performed for 20 s in MIBK (squares), n-amyl acetate (triangles), IPA/water (7:3) (crosses), xylene (stars), xylene/methanol (3:1) (circles), and MIBK/IPA (1:3) (diamonds).

Mohammad et al. Nanoscale Research Letters 2013 8:139   doi:10.1186/1556-276X-8-139
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