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Nucleant layer effect on nanocolumnar ZnO films grown by electrodeposition

Maria D Reyes Tolosa1*, Laura C Damonte2, Hicham Brine3, Henk J Bolink3 and María A Hernández-Fenollosa1

Author affiliations

1 Instituto de Tecnología de Materiales, Universitat Politècnica de València, Camino de Vera s/n, Valencia, 46022, Spain

2 Departamento de Física, Facultad de Ciencias Exactas, Universidad Nacional de La Plata-IFLP, CCT, CONICET, C.C.67, La Plata, 1900, Argentina

3 Instituto de Ciencia Molecular, Universidad de Valencia, C/ Catedrático J. Beltrán 2, Paterna, ES-46980, Spain

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Citation and License

Nanoscale Research Letters 2013, 8:135  doi:10.1186/1556-276X-8-135

Published: 23 March 2013


Different ZnO nanostructured films were electrochemically grown, using an aqueous solution based on ZnCl2, on three types of transparent conductive oxides grow on commercial ITO (In2O3:Sn)-covered glass substrates: (1) ZnO prepared by spin coating, (2) ZnO prepared by direct current magnetron sputtering, and (3) commercial ITO-covered glass substrates. Although thin, these primary oxide layers play an important role on the properties of the nanostructured films grown on top of them. Additionally, these primary oxide layers prevent direct hole combination when used in optoelectronic devices. Structural and optical characterizations were carried out by scanning electron microscopy, atomic force microscopy, and optical transmission spectroscopy. We show that the properties of the ZnO nanostructured films depend strongly on the type of primary oxide-covered substrate used. Previous studies on different electrodeposition methods for nucleation and growth are considered in the final discussion.

Spin coating; Electrodeposition; ZnO films; DC magnetron sputtering