Figure 2.

Schematic diagram of MIS structure and cross-sectional TEM of Al/Al2O3/SiC. (a) A schematic diagram of the MIS structure. (b) The cross-sectional TEM of the Al/Al2O3/SiC contact, showing that Al2O3 was deposited uniformly as a fully amorphous film.

Zheng et al. Nanoscale Research Letters 2013 8:116   doi:10.1186/1556-276X-8-116
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