Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition

Zhi-Yuan Ye; Hong-Liang Lu; Yang Geng; Yu-Zhu Gu; Zhang-Yi Xie; Yuan Zhang; Qing-Qing Sun; Shi-Jin Ding; David Wei Zhang

doi:10.1186/1556-276X-8-108

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Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition

Zhi-Yuan Ye, Hong-Liang Lu^*, Yang Geng, Yu-Zhu Gu, Zhang-Yi Xie, Yuan Zhang, Qing-Qing Sun, Shi-Jin Ding and David Wei Zhang

* Corresponding author: Hong-Liang Lu honglianglu@fudan.edu.cn

Nanoscale Research Letters 2013, 8:108 doi:10.1186/1556-276X-8-108

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Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition

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Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition