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Characterization of epitaxial GaAs MOS capacitors using atomic layer-deposited TiO2/Al2O3 gate stack: study of Ge auto-doping and p-type Zn doping

Goutam Kumar Dalapati*, Terence Kin Shun Wong, Yang Li, Ching Kean Chia, Anindita Das, Chandreswar Mahata, Han Gao, Sanatan Chattopadhyay, Manippady Krishna Kumar, Hwee Leng Seng, Chinmay Kumar Maiti and Dong Zhi Chi

Nanoscale Research Letters 2012, 7:99  doi:10.1186/1556-276X-7-99

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