Table 1

The AD parameters for the Al2O3-polyimide composite thick films

Deposition conditions


Starting powder

Ceramic: α-Al2O3

Polymer: polyimide

Substrate

Cu and glass

Carrier gas

He

Size of nozzle orifice

10 × 0.4 mm2

Scanning speed

1 mm/sec

Working pressure

6-8 Torr

Consumption of carrier gas

1-2 L/min

Distance between substrate and nozzle

10 mm

Deposition temperature

Room temperature

Deposition time

10-40 min

Deposition area

10 × 10 mm2


Kim and Nam Nanoscale Research Letters 2012 7:92   doi:10.1186/1556-276X-7-92

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