Figure 2.

XRD patterns of the ZnO nanorod arrays grown on p+-Si(111)substrate. (a) as-grown and after thermal annealing process at various temperatures (b) 200°C, (c) 400°C, (d) 600°C, and (e) 800°C, respectively.

Tsai et al. Nanoscale Research Letters 2012 7:664   doi:10.1186/1556-276X-7-664
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