Figure 3.

SKM, CAFM, and SCM images (left column) and 3D views (right column) of BPA-etched GeSi QR. (a) Height image measured simultaneously with the CPD image, (b) CPD image obtained at an AC modulation of 2 V and a lift height of 10 nm. (c) Current image measured at a sample bias of −1 V. (d) dC/dV amplitude image obtained by applying 2 V AC modulation to the sample. Each scale bar is 50 nm.

Lv et al. Nanoscale Research Letters 2012 7:659   doi:10.1186/1556-276X-7-659
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