Table 2
RMS roughness for CuPc films after post-annealing for 1 h under vacuum
Post-annealing effect
Heating T (°C)	RMS (nm)	Figure
0 (as grown film)	2.05 ± 0.40	Figure 3a
150	1.79 ± 0.29	Figure 3b
250	0.89 ± 0.05	Figure 3c

Bae et al. Nanoscale Research Letters 2012 7:650   doi:10.1186/1556-276X-7-650