Table 2

RMS roughness for CuPc films after post-annealing for 1 h under vacuum
Post-annealing effect
Heating T (°C) RMS (nm) Figure
0 (as grown film) 2.05 ± 0.40 Figure 3a
150 1.79 ± 0.29 Figure 3b
250 0.89 ± 0.05 Figure 3c

Bae et al.

Bae et al. Nanoscale Research Letters 2012 7:650   doi:10.1186/1556-276X-7-650

Open Data