Table 1

Compositional results (atomic percentages of oxygen (O) and silicon (Si))
Temperature (°C) dss (mm) Atomic percentage x= O/Si
O Si
1,400 2 30.76 69.22 0.44
1,300 3 61.60 38.38 1.60
1,150 4 56.02 43.96 1.27
1,050 5 64.48 35.50 1.81
900 6 62.49 37.50 1.66

Results of the SiOx films obtained by XEDS.

López et al.

López et al. Nanoscale Research Letters 2012 7:604   doi:10.1186/1556-276X-7-604

Open Data