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A flexible nanobrush pad for the chemical mechanical planarization of Cu/ultra-low-к materials

Guiquan Han, Yuhong Liu, Xinchun Lu and Jianbin Luo*

Author Affiliations

State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China

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Nanoscale Research Letters 2012, 7:603  doi:10.1186/1556-276X-7-603

Published: 30 October 2012


A new idea of polishing pad called flexible nanobrush pad (FNP) has been proposed for the low down pressure chemical mechanical planarization (CMP) process of Cu/ultra-low-к materials. The FNP was designed with a surface layer of flexible brush-like nanofibers which can ‘actively’ carry nanoscale abrasives in slurry independent of the down pressure. Better planarization performances including high material removal rate, good planarization, good polishing uniformity, and low defectivity are expected in the CMP process under the low down pressure with such kind of pad. The FNP can be made by template-assisted replication or template-based synthesis methods, which will be driven by the development of the preparation technologies for ordered nanostructure arrays. The present work would potentially provide a new solution for the Cu/ultra-low-к CMP process.

Flexible nanobrush pad; Polishing pad; Chemical mechanical planarization; Cu/ultra-low-к integration