Figure 2.

Cross-sectional SEM images. Silicon samples are etched in the solution containing 4.6 M HF, 0.02 M AgNO3, and 0.05 M KMnO4 for different reaction times. (a) 15 min; (b) 45 min; (c) 90 min.

Bai et al. Nanoscale Research Letters 2012 7:557   doi:10.1186/1556-276X-7-557
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