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Table 1
Summary of SiNW arrays with varied diameters and porosities
	Diameter control	Porosity control
Set 1	Nanosphere lithography	Etching method and doping concentration
	d_avg≈ 300 to 350 nm	Nonporous: DRIE
	VF_DRIE = 21% to 23%	Low porosity: Ag/Au MACE
	VF_MACE = 45% to 60%	Moderate porosity: Ag MACE, lightly doped
	VF_MACE = 45% to 60%	High porosity: Ag MACE, heavily doped
Set 2	Silver salts	MACE etchant solution
Set 2	d_avg≈ 130 nm	Low porosity, 0.15 M H₂O₂
	VF = 26% to 35%	High porosity, 1.2 M H₂O₂

Weisse et al. Nanoscale Research Letters 2012 7:554 doi:10.1186/1556-276X-7-554

Table 1