Table 1

Summary of SiNW arrays with varied diameters and porosities
Diameter control Porosity control
Set 1 Nanosphere lithography Etching method and doping concentration
  davg 300 to 350 nm   Nonporous: DRIE
  VFDRIE = 21% to 23%   Low porosity: Ag/Au MACE
  VFMACE = 45% to 60%   Moderate porosity: Ag MACE, lightly doped
  High porosity: Ag MACE, heavily doped
Set 2 Silver salts MACE etchant solution
  davg 130 nm   Low porosity, 0.15 M H2O2
  VF = 26% to 35%   High porosity, 1.2 M H2O2

Weisse et al.

Weisse et al. Nanoscale Research Letters 2012 7:554   doi:10.1186/1556-276X-7-554

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