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Table 1
Summary of measured sheet resistances from different post treatments for SWNT films of varied metallic/semiconducting content
	5% M-SWNT (95% S-SWNT) (%)	50% M-SWNT (50% S-SWNT) (%)	90% M-SWNT (10% S-SWNT) (%)
After annealing	+17.5	−27.5	−65.2
After acid treatment	−96.64	−51.3	−15.0
Combined effect	−76.3(R_s↓)	−78.8(R_s↓)	−80.2(R_s↓)

Tey et al. Nanoscale Research Letters 2012 7:548 doi:10.1186/1556-276X-7-548

Table 1