Table 1

Summary of measured sheet resistances from different post treatments for SWNT films of varied metallic/semiconducting content
5% M-SWNT (95% S-SWNT) (%) 50% M-SWNT (50% S-SWNT) (%) 90% M-SWNT (10% S-SWNT) (%)
After annealing +17.5 −27.5 −65.2
After acid treatment −96.64 −51.3 −15.0
Combined effect −76.3(Rs↓) −78.8(Rs↓) −80.2(Rs↓)

Tey et al.

Tey et al. Nanoscale Research Letters 2012 7:548   doi:10.1186/1556-276X-7-548

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