Figure 4.

Rough estimation for contact resistance (Rc) at the electrode-SWNTs interface. The ΔRii (values reported in Table 1) is the result of Rc, Rintratube, and Rcnt-cnt changes upon annealing. With additional annealing step (case (i)) carried out before electrode deposition, lesser resistance reduction was observed (ΔRi <ΔRii). This resistance change (ΔRi) is deduced to be the Rc contribution from the metal electrode.

Tey et al. Nanoscale Research Letters 2012 7:548   doi:10.1186/1556-276X-7-548
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