Figure 1.

Schematic diagrams of fabrication processes for three-dimensional AZO/Al₂O₃/AZO nanocapacitor arrays. (a) The formation of AAO templates on the Si substrate, (b) atomic layer deposition of the AZO/Al₂O₃/AZO stack (defined as MIM structure), and (c) the formation of capacitors for electrical measurements, including three-dimensional nanocapacitor arrays and a top contact layer of Ta film.