Figure 1.

Schematic diagrams of fabrication processes for three-dimensional AZO/Al2O3/AZO nanocapacitor arrays. (a) The formation of AAO templates on the Si substrate, (b) atomic layer deposition of the AZO/Al2O3/AZO stack (defined as MIM structure), and (c) the formation of capacitors for electrical measurements, including three-dimensional nanocapacitor arrays and a top contact layer of Ta film.

Li et al. Nanoscale Research Letters 2012 7:544   doi:10.1186/1556-276X-7-544
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