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Submicron machining and biomolecule immobilization on porous silicon by electron beam

Dario Imbraguglio*, Andrea Mario Giovannozzi, Annalisa Nastro and Andrea Mario Rossi

Author affiliations

Thermodynamics Division, Istituto Nazionale di Ricerca Metrologica, Strada delle Cacce 91, Torino, 10135, Italy

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Citation and License

Nanoscale Research Letters 2012, 7:530  doi:10.1186/1556-276X-7-530

Published: 25 September 2012


Three-dimensional submicrometric structures and biomolecular patterns have been fabricated on a porous silicon film by an electron beam-based functionalization method. The immobilized proteins act as a passivation layer against material corrosion in aqueous solutions. The effects' dependence on the main parameters of the process (i.e., the electron beam dose, the biomolecule concentration, and the incubation time) has been demonstrated.

Porous silicon; Electron beam; Lithography; Micromachining; Biomolecules; 87.85.Va