|
Resolution: standard / high Figure 1.
Typical TEM and SEM micrographs of SiNWs: (a) a schematic representation of the MACE
procedure; (b) TEM image of an individual SiNW, where thicknesses of the whole SiNW
and its nanostructured side are marked by yellow symbols D and d, respectively; and
(c,d) SEM micrographs of the SiNW arrays with and without Ag nanoparticles (marked
by yellow arrow).
Osminkina et al. Nanoscale Research Letters 2012 7:524 doi:10.1186/1556-276X-7-524 |
