Figure 1.

Typical TEM and SEM micrographs of SiNWs: (a) a schematic representation of the MACE procedure; (b) TEM image of an individual SiNW, where thicknesses of the whole SiNW and its nanostructured side are marked by yellow symbols D and d, respectively; and (c,d) SEM micrographs of the SiNW arrays with and without Ag nanoparticles (marked by yellow arrow).

Osminkina et al. Nanoscale Research Letters 2012 7:524   doi:10.1186/1556-276X-7-524
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