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Open Access Nano Express

Microplasma illumination enhancement of vertically aligned conducting ultrananocrystalline diamond nanorods

Kamatchi Jothiramalingam Sankaran1, Srinivasu Kunuku2, Shiu-Cheng Lou3, Joji Kurian4, Huang-Chin Chen4, Chi-Young Lee1, Nyan-Hwa Tai1*, Keh-Chyang Leou2, Chulung Chen3 and I-Nan Lin4*

Author Affiliations

1 Department of Materials Science and Engineering, National Tsing-Hua University, Hsinchu, Taiwan 300, Republic of China

2 Department of Engineering and System Science, National Tsing-Hua University, Hsinchu, Taiwan 300, Republic of China

3 Department of Photonics Engineering, Yuan Ze University, Chung-Li, Taiwan 32003, Republic of China

4 Department of Physics, Tamkang University, Tamsui, Taiwan 251, Republic of China

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Nanoscale Research Letters 2012, 7:522  doi:10.1186/1556-276X-7-522

Published: 25 September 2012


Vertically aligned conducting ultrananocrystalline diamond (UNCD) nanorods are fabricated using the reactive ion etching method incorporated with nanodiamond particles as mask. High electrical conductivity of 275 Ω·cm−1 is obtained for UNCD nanorods. The microplasma cavities using UNCD nanorods as cathode show enhanced plasma illumination characteristics of low threshold field of 0.21 V/μm with plasma current density of 7.06 mA/cm2 at an applied field of 0.35 V/μm. Such superior electrical properties of UNCD nanorods with high aspect ratio potentially make a significant impact on the diamond-based microplasma display technology.

Ultrananocrystalline diamond nanorods; Reactive ion etching; Microplasma; Electron field emission properties