Figure 3.

SEM image of the FIB processed area. The thick red line represents the location of the bismuth nanowire in the quartz template. The inset shows a magnified figure of the exposed side area of the nanowire. Points 1 and 2 indicate the locations used for EDX analysis.

Murata et al. Nanoscale Research Letters 2012 7:505   doi:10.1186/1556-276X-7-505
Download authors' original image