Figure 1.

Schematic diagram showing the processing for preparation of a bismuth nanowire for Hall measurements. (a) Polishing, (b) detection of the nanowire location, (c) removal of the side parts of the template, (d) exposure of the wire surface, (e) 3-D view of the exposed wire surface, (f) carbon deposition to form electrical contacts, and (g) contact between carbon film and copper electrodes located on the top of the quartz.

Murata et al. Nanoscale Research Letters 2012 7:505   doi:10.1186/1556-276X-7-505
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