Figure 1.

R/R (300 K) versus T for three TiSi NW samples. The right panels show the schematic depicting the Pt-electrode/TiSi-NW contact made by the FIBID technique and the SEM image of the NW sample.

Hsu et al. Nanoscale Research Letters 2012 7:500   doi:10.1186/1556-276X-7-500
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