Open Access Nano Express

Concentration gradient induced morphology evolution of silica nanostructure growth on photoresist-derived carbon micropatterns

Dan Liu1, Tielin Shi2, Shuang Xi2, Wuxing Lai2, Shiyuan Liu2, Xiaoping Li1 and Zirong Tang12*

Author Affiliations

1 Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China

2 State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074, China

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Nanoscale Research Letters 2012, 7:496  doi:10.1186/1556-276X-7-496

Published: 3 September 2012

Abstract

The evolution of silica nanostructure morphology induced by local Si vapor source concentration gradient has been investigated by a smart design of experiments. Silica nanostructure or their assemblies with different morphologies are obtained on photoresist-derived three-dimensional carbon microelectrode array. At a temperature of 1,000°C, rope-, feather-, and octopus-like nanowire assemblies can be obtained along with the Si vapor source concentration gradient flow. While at 950°C, stringlike assemblies, bamboo-like nanostructures with large joints, and hollow structures with smaller sizes can be obtained along with the Si vapor source concentration gradient flow. Both vapor–liquid-solid and vapor-quasiliquid-solid growth mechanisms have been applied to explain the diverse morphologies involving branching, connecting, and batch growth behaviors. The present approach offers a potential method for precise design and controlled synthesis of nanostructures with different features.

Keywords:
Silica nanostructure; Morphology; Concentration gradient; Evolution; Micropattern; 62.23.St complex nanostructures; 61.46.Np structure of nanotubes; 85.40.Hp lithography; masks and pattern transfer