Table 1

Experimental parameters for the deposition of InN films/nanorods
Sample Morphology Temperature (°C) RF-plasma power (W) V/III ratio
1 Film 500 400 0.75
2 Rods 500 350 2.5

Chen et al.

Chen et al. Nanoscale Research Letters 2012 7:468   doi:10.1186/1556-276X-7-468

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