Table 3 |
|||
| 45-nm process propagation delay computation between CNTFET (with and without interconnect) and MOSFET (post-layout simulation) | |||
| Logic circuits | CNTFET with 45-nm process design guidelines | MOSFET with 45-nm process | |
| Delay without interconnects | Delay with 5-μm interconnect | Delay (post-layout simulation) | |
| Propagation delay, | Propagation delay, | Propagation delay, | |
| t p(ps) | t p(ps) | t p(ps) | |
| NOT | 0.14 | 9.277 | 5.005 |
| NAND2 | 0.39 | 12.97 | 8.719 |
| NAND3 | 0.61 | 16.87 | 11.343 |
| NOR2 | 0.47 | 12.98 | 8.797 |
| NOR3 | 0.50 | 16.48 | 11.655 |
Tan et al. Nanoscale Research Letters 2012 7:467 doi:10.1186/1556-276X-7-467