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Fabrication of porous silicon by metal-assisted etching using highly ordered gold nanoparticle arrays

Sebastian P Scheeler, Simon Ullrich, Stefan Kudera and Claudia Pacholski*

Author Affiliations

Max Planck Institute for Intelligent Systems, Department of New Materials and Biosystems, Heisenbergstrasse 3, Stuttgart, 70569, Germany

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Nanoscale Research Letters 2012, 7:450  doi:10.1186/1556-276X-7-450

Published: 9 August 2012

Additional files

Additional file 1:

Low magnification SEM images of gold nanoparticle arrays fabricated using differently treated surfaces and annealing techniques. SEM images of gold nanoparticle arrays prepared using differently treated surfaces and annealing techniques. (a) hydrophilic surface (piranha)/plasma treatment, (b) hydrophilic surface (piranha)/flame annealing, and (c) hydrophobic surface (HF treatment)/flame annealing. Scale bar is 1 μm. (DOC 4990 kb)

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Additional file 2:

Low magnification SEM images of a typical gold nanoparticle array and porous silicon samples fabricated by metal-assisted etching. SEM images of a typical gold nanoparticle array and porous silicon samples which have been prepared by metal-assisted etching. The etching masks were fabricated using different methods. The insets show the corresponding FFTs. (a) gold nanoparticle array, (b) piranha solution/plasma treatment, (c) piranha solution/flame annealing, and (d) HF/flame annealing. (DOC 14557 kb)

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