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Resolution: standard / high Figure 1.
SEM images of nanopillar array manufactured by new mask-free lithography with various
PMMA resists. (a) PMMA A2, (b) PMMA A8, and (c) PMMA A11.
Kim et al. Nanoscale Research Letters 2012 7:430 doi:10.1186/1556-276X-7-430 |
