Open Access Nano Express

A simple and fast fabrication of a both self-cleanable and deep-UV antireflective quartz nanostructured surface

Jung Suk Kim1, Hyun Woo Jeong2, Wonbae Lee34, Bo Gi Park2, Beop Min Kim23* and Kyu Back Lee23*

Author Affiliations

1 Department of Biomedical Engineering, College of Medicine, Korea University, Seoul, 136-701, Korea

2 Department of Interdisciplinary Bio/Micro System Technology, College of Engineering, Korea University, Seoul, 136-701, Korea

3 Department of Biomedical Engineering, College of Health Science, Korea University, San 1, Jeongneung-3-dong, Seongbuk-gu, Seoul, 136-703, Korea

4 Research Institute of Health Science, Korea University, San 1, Jeongneung-3-dong, Seongbuk-gu, Seoul, 136-703, Republic of Korea

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Nanoscale Research Letters 2012, 7:430  doi:10.1186/1556-276X-7-430

Published: 1 August 2012

Abstract

Both self-cleanability and antireflectivity were achieved on quartz surfaces by forming heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane self-assembled monolayer after fabrication of nanostructures with a mask-free method. By exposing polymethylmethacrylate spin-coated quartz plates to O2 reactive ion etching (RIE) and CF4 RIE successively, three well-defined types of nanopillar arrays were generated: A2, A8, and A11 patterns with average pillar widths of 33 ± 4 nm, 55 ± 5 nm, and 73 ± 14 nm, respectively, were formed. All the fabrication processes including the final cleaning can be finished within 4 h. All nanostructured quartz surfaces exhibited contact angles higher than 155° with minimal water droplet adhesiveness and enhanced transparency (due to antireflectivity) over a broad spectral range from 350 to 900 nm. Furthermore, A2 pattern showed an enhanced antireflective effect that extends to the deep-UV range near 190 nm, which is a drawback region in conventional thin-film-coating approaches as a result of thermal damage. Because, by changing the conditions of successive RIE, the geometrical configurations of nanostructure arrays can be easily modified to meet specific needs, the newly developed fabrication method is expected to be applied in various optic and opto-electrical areas.

PACS codes: 06.60.Ei; 81.65.Cf; 81.40.Vw.

Keywords:
Antireflection; Superhydrophobicity; Nanostructure; Mask-free; Deep-UV