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Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method

Zhiya Dang1*, Mark BH Breese12, Gonzalo Recio-Sánchez3, Sara Azimi1, Jiao Song1, Haidong Liang1, Agnieszka Banas2, Vicente Torres-Costa3 and Raúl José Martín-Palma3

Author Affiliations

1 Centre For Ion Beam Applications (CIBA), Department Of Physics, National University Of Singapore, Singapore, 117542, Singapore

2 Singapore Synchrotron Light Source (SSLS), National University of Singapore, 5 Research Link, Singapore, 117603, Singapore

3 Departamento De Física Aplicada, Universidad Autónoma De Madrid, Cantoblanco, Madrid, 28049, Spain

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Nanoscale Research Letters 2012, 7:416  doi:10.1186/1556-276X-7-416

Published: 23 July 2012


A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-based photonic crystals with high flexibility and industrial compatibility. In this work, we present the fabrication of 2D photonic lattice and photonic slab structures and propose a process for the fabrication of 3D woodpile photonic crystals based on this approach. Simulated results of photonic band structures for the fabricated 2D photonic crystals show the presence of TE or TM gap in mid-infrared range.

Proton beam writing; Defect density; Photonic band structure