SEM images of macropore arrays formed in (100) silicon. (a) Plan view and (b) cross-sectional SEM images of Au-coated (100) silicon after chemical etching in 15 mol dm−3 HF/1 mol dm−3 H2O2 for 1 min using photoresist honeycomb mask. The periodicity of the openings of the mask was 3 μm.
Asoh et al. Nanoscale Research Letters 2012 7:406 doi:10.1186/1556-276X-7-406