Figure 4.

SEM images of macropore arrays formed in (100) silicon. (a) Plan view and (b) cross-sectional SEM images of Au-coated (100) silicon after chemical etching in 15 mol dm−3 HF/1 mol dm−3 H2O2 for 1 min using photoresist honeycomb mask. The periodicity of the openings of the mask was 3 μm.

Asoh et al. Nanoscale Research Letters 2012 7:406   doi:10.1186/1556-276X-7-406
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