Figure 1.

Fabrication process schematic: ordered silicon macropore arrays using (A) polystyrene and (B) photoresist honeycomb masks. (a) Formation of binary colloidal crystals composed of SiO2 and polystyrene spheres on silicon substrate, (b) removal of SiO2 spheres after heating, (c) formation of metal catalyst layer, (d) chemical etching of silicon, (e) formation of a monolayer of SiO2 spheres on the photoresist layer formed on silicon substrate, (f) development of resist sites exposed through SiO2 spheres, (g) formation of metal catalyst layer, and (h) chemical etching of silicon.

Asoh et al. Nanoscale Research Letters 2012 7:406   doi:10.1186/1556-276X-7-406
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