Figure 1.

Schematic representation of the process. (a) SEM cross-sectional tilted view of a macroporous layer grown on a Ti/Au prepatterned substrate (WP1 geometry) (b) and (c). The etching current was set at the constant value of 91 mA/cm2 for 25 min. A fresh HF/DMF mixture was used as electrolyte. The metal layers were released after few minutes of etching.

Scheen et al. Nanoscale Research Letters 2012 7:395   doi:10.1186/1556-276X-7-395
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