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Effective surface oxidation of polymer replica molds for nanoimprint lithography

Ilhwan Ryu, Dajung Hong and Sanggyu Yim*

Author Affiliations

Department of Chemistry, Kookmin University, Seoul, 136-702, South Korea

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Nanoscale Research Letters 2012, 7:39  doi:10.1186/1556-276X-7-39

Published: 5 January 2012


In nanoimprint lithography, a surface oxidation process is needed to produce an effective poly(dimethylsiloxane) coating that can be used as an anti-adhesive surface of template molds. However, the conventional photooxidation technique or acidic oxidative treatment cannot be easily applied to polymer molds with nanostructures since surface etching by UV radiation or strong acids significantly damages the surface nanostructures in a short space of time. In this study, we developed a basic oxidative treatment method and consequently, an effective generation of hydroxyl groups on a nanostructured surface of polymer replica molds. The surface morphologies and water contact angles of the polymer molds indicate that this new method is relatively nondestructive and more efficient than conventional oxidation treatments.