Table 2

Ingredients of a typical NIL resist used in this study and their functions
Ingredient wt.% Function
Ia 1 Silicon-containing oligomer; increases the viscosity and polarity of resist and provides high cross-linking density
IIa 4 Silicon-containing oligomer; provides oxygen RIE etching resistance and moderate cross-linking density
IIIa 0.5 Silicon-containing oligomer; relieves mechanical properties as plasticizer
PGMEA 94.2 Low-viscosity diluents; improves resist flow for spin coating
Diphenyliodonium salt 0.3 Photo-initiator; generates cationic acids upon exposure to UV radiation

aI, II, and III are the same epoxysiloxane samples listed in Table 1.

Zhang et al.

Zhang et al. Nanoscale Research Letters 2012 7:380   doi:10.1186/1556-276X-7-380

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