Figure 2.

Schematic illustration UV-assisted thermal curing imprint process. (a) Preexposure of the epoxysiloxane resist by a cold UV-light; (b) imprint with a mold that can be opaque; (c) thermal curing the imprinted resist; and (d) mold release from the resist.

Zhang et al. Nanoscale Research Letters 2012 7:380   doi:10.1186/1556-276X-7-380
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