Figure 4.

Time evolution of the applied voltage during a constant current electrochemical Er insertion process. The behavior recorded for two different thicknesses is shown: 1.25 (a) and 10 μm (b). In both cases, the curves from different samples are well superposed. The vertical dotted lines indicate the approximate position where the behavioral change begins. The horizontal dotted lines indicate the plateau voltage common to all samples.

Mula et al. Nanoscale Research Letters 2012 7:376   doi:10.1186/1556-276X-7-376
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