Figure 5.

Locally opened through-silicon macropores. Optical microscope view of selective through-silicon macropore. This structure is achieved by alkaline etching (highly concentrated KOH solution at 80 °C) of the backside of the substrate through an oxide mask.

Defforge et al. Nanoscale Research Letters 2012 7:375   doi:10.1186/1556-276X-7-375
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